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AMAT 0200-36524
Product Name: High-Purity Quartz Gas Distribution Nozzle
Product Description: A precision-formed fused quartz nozzle that delivers process gases directly to the wafer edge. It ensures uniform gas flow and prevents thermal shock to the wafer edge during high-temperature deposition.
Technical Specifications:
- Material: High-purity synthetic fused silica (SiO₂ > 99.998%)
Detailed content
- Geometry: Multi-bore, angled-flow design (8 ports, 0.4mm diameter)
- Dimensions: 80mm length, 12mm outer diameter
- Temperature Rating: Up to 1100°C
- Surface Finish: Fire-polished internal bore (Ra < 0.5μm)
- Purity: Ultra-low metallic impurities (< 1ppb total)
- Leak Integrity: Vacuum-tight, < 1 x 10⁻⁹ atm·cc/s He
Key Features:
- Chemically inert to all halogenated process gases
- High thermal shock resistance
- Minimizes edge bead formation during deposition
- Smooth internal surfaces eliminate particle trapping
- Transparent for in-situ process monitoring
Application Scenarios:
Used in AMAT Centura HDP-CVD and PECVD chambers for 200mm wafers. Ideal for depositing SiO₂, Si₃N₄, and TEOS-based films requiring exceptional edge uniformity.
