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Technical Specifications:
- Material: High-purity synthetic fused silica (quartz)
- Purity: > 99.99% SiO₂
- Dimensional Tolerance: ±0.005 inches
- Temperature Resistance: Up to 1200°C
Functional Features:
- Excellent optical transparency for UV or lamp-based heating processes
- High chemical resistance to most process chemistries
- Low metal ion contamination, critical for semiconductor purity
- Low thermal expansion minimizes thermal stress
Application: Used as a protective liner or shield in high-temperature oxidation, diffusion, and PVD chambers.
