Digital guide
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- Material: High-purity, thermally stable ceramic composite
- Surface: Coated for uniform thermal emissivity and non-contamination
- Features: Precision-machined for balanced high-speed rotation
Functional Features:
- Delivers excellent thermal uniformity for consistent epitaxial layer growth.
- Rotational balance ensures stable wafer processing at high speeds.
- Material composition prevents outgassing and particle generation under high temperatures.
Application Scenarios: AMAT EPI systems for 200mm silicon wafer epitaxial deposition.
