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AMAT 0200-20005
Product Name: Quartz Chamber Liner / Shield
Product Description: A high-purity quartz fabricated liner or shield designed to line the interior of a process chamber, protecting it from deposition and plasma damage.
Technical Specifications:
- Material: High-purity, fused synthetic quartz (SiO2)
Detailed content
- Thermal Stability: Resistant to thermal shock up to 1100°C
- Purity: Ultra-low metallic impurity content (ppb level)
- Transmission: High optical transparency for UV/thermal processes
Functional Features:
- Excellent chemical resistance to process gases and plasmas.
- Does not contaminate wafers with heavy metals.
- Absorbs and dissipates heat uniformly across the chamber wall.
Application Scenarios: Liner for PECVD, LPCVD, and Etch chambers requiring high-purity quartz components.
