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AMAT 0200-18082
Product Name: Ceramic Center Nozzle (1.76L, HDPCVD)
Product Description: A high-purity ceramic nozzle designed for precise gas delivery in HDPCVD (High-Density Plasma Chemical Vapor Deposition) systems.
Technical Specifications:
- Material: Ultra-high-purity, high-strength ceramic (Alumina or Aluminum Nitride).
Detailed content
- Volume: 1.76 Liters.
- Design: Center-feed, single-port nozzle for uniform gas distribution.
- Temperature Resistance: Withstands continuous high-temperature exposure (>500°C).
- Corrosion Resistance: Inert to corrosive precursor gases (e.g., TEOS, Silane).
Functional Features:
- Ensures laminar flow and uniform distribution of process gases.
- High thermal shock resistance to withstand rapid thermal cycling.
- Non-contaminating, low-outgassing properties for ultra-clean processes.
- Precision-engineered flow dynamics for consistent thin-film growth.
Application Scenarios:
- Deployed in AMAT Centura HDPCVD chambers for dielectric film deposition.
- Used for depositing high-quality oxides and nitrides in advanced semiconductor fabrication.
