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AMAT 0200-10555
Product Name: Quartz Baseplate with Baffle
Product Description: A fused quartz structural baseplate integrated with a baffle for thermal management and process gas distribution in semiconductor chambers.
Technical Specifications:
- Material: High-purity synthetic fused silica (SiO₂).
Detailed content
- Thermal Expansion Coefficient: ~5.5 × 10⁻⁷ /°C.
- Max Operating Temperature: 1200°C.
- Dimensions: Precision machined to OEM tolerances (±0.05 mm).
- Transmittance: > 90% in UV range.
Functional Features:
- Exceptional thermal stability and low thermal expansion.
- High chemical inertness, resistant to most acids and plasmas.
- Baffle design ensures uniform gas flow and temperature distribution.
- Non-contaminating, ideal for ultra-high purity processes.
Application Scenarios: Used in PECVD, LPCVD, and oxidation furnaces for holding substrates and directing process gases.
