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AMAT 0200-10415
Product Name: Quartz Etch Chamber Liner
Product Description: A high-purity fused quartz liner manufactured for semiconductor etching chambers, providing a chemically inert and thermally stable interior chamber surface to isolate process plasmas from the chamber body and maintain ultra-clean processing conditions.
Technical Specifications:
- Material: High-purity synthetic fused silica (SiO₂), purity ≥99.99%
Detailed content
- Temperature Resistance: Continuous service up to 1200℃
- Surface Finish: Fire-polished internal surface, Ra ≤0.2μm
- Structural Form: Cylindrical sleeve with precision-machined mounting notches
- Dimensional Tolerance: ±0.005mm for concentricity and fitting
Functional Features:
- Excellent resistance to fluorine-based and oxygen-based plasma corrosion
- Ultra-low outgassing rate suitable for ultra-high vacuum environments
- Outstanding thermal shock resistance to withstand rapid temperature fluctuations
- Non-contaminating surface with minimal particle generation
- Easy to clean and replace during preventive maintenance cycles
Application Scenarios: Applied in dielectric etch chambers, poly etch chambers and other plasma etching systems in AMAT Centura and Endura platforms.
