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AMAT 0200-10390
Product Name: Chamber RPS GDP Assembly
Product Description: A precision-engineered chamber component assembly for Remote Plasma Source (RPS) and Gas Distribution Plate (GDP) systems in semiconductor manufacturing equipment.
Technical Specifications:
- Material: 316L stainless steel
Detailed content
- Diameter: 300 mm
- Thickness: 15 mm
- Number of Gas Holes: 1500 (0.4 mm diameter)
- Hole Pattern: Uniform hexagonal distribution
- Surface Finish: Electropolished internally to Ra <0.2 μm
- Operating Pressure: 0–15 Torr
- Operating Temperature: -20°C to +160°C
- Gas Compatibility: All standard semiconductor process gases
- Leak Rate: <1×10⁻⁹ atm-cc/sec He
- Weight: 1.11 kg
Functional Features:
- Uniform gas distribution for consistent process results
- High-density hole pattern for excellent process uniformity
- Smooth internal surfaces to minimize flow resistance
- Corrosion-resistant construction for process compatibility
- Easy installation and maintenance
- Precision machining for perfect chamber fit
- Low particle generation during operation
Application Scenarios:
- Semiconductor remote plasma source systems
- Chemical Vapor Deposition (CVD) chambers
- Atomic Layer Deposition (ALD) equipment
- Thin-film deposition process tools
- Semiconductor manufacturing process chambers
