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AMAT 0200-10239
Product Name: High-Temperature Ceramic Focus Ring
Product Description: A precision-engineered ceramic ring that shapes and confines plasma to the wafer surface during etching and deposition processes.
Technical Specifications:
- Material: Yttria-stabilized zirconia (YSZ) or high-purity alumina
Detailed content
- Purity: ≥ 99.6%
- Dimensional Tolerance: ±0.005mm for perfect concentricity
- Surface Finish: Ra ≤ 0.4μm
- Temperature Rating: Up to 800°C continuous
Functional Features:
- Plasma Confinement: Optimizes plasma density for uniform processing
- Wafer Edge Control: Prevents edge effects for consistent feature size across wafer
- Plasma Resistance: Highly resistant to dielectric etch plasmas
- Low Particle Generation: Smooth surface minimizes flaking and contamination
Application: Used in dielectric etch chambers (DPS II, DPS G3) for 200mm/300mm wafer patterning.
