Digital guide
You are here:
AMAT 0200-10153
Product Name: Chamber Liner Assembly
Product Description: A protective cylindrical liner installed inside semiconductor processing chambers to shield the main chamber body from plasma exposure, chemical corrosion, and process byproduct accumulation. It preserves chamber integrity and simplifies maintenance.
Technical Specifications:
- Material: High-purity quartz or anodized aluminum
Detailed content
- Dimensional Accuracy: ±0.02 mm machining tolerance
- Temperature Resistance: Up to 1200°C for quartz versions
- Coating: Optional anti-reflective or plasma-resistant coating
- Weight: 0.8–1.2 kg depending on chamber size
- Compatibility: Designed for standard AMAT chamber profiles
Functional Features:
- Isolates chamber wall from direct plasma contact
- Reduces particle contamination during processing
- Extends overall chamber service life
- Simplifies routine cleaning and replacement
- Maintains consistent plasma environment stability
- Resists etching by fluorine and chlorine chemistries
Application Scenarios:
- Plasma etch chambers
- PVD and CVD processing equipment
- Semiconductor wafer fabrication cleanrooms
- High-density plasma processing systems
- AMAT Centura and Endura platforms
