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AMAT 0200-09768
Brand & Part Number: Applied Materials (AMAT) 0200-09768
Product Name: Chamber Shield Liner Assembly
Product Description: A one-piece, contoured shield designed to line the interior of a semiconductor process chamber, protecting the chamber body from plasma erosion, chemical corrosion, and thin-film deposition.
Detailed content
Technical Specifications:
- Material: High-purity silicon carbide (SiC) or aluminum oxide (Al₂O₃) ceramic
- Operating Temperature: Up to 600°C
- Surface Finish: Polished, Ra ≤ 0.8 μm
- Flatness: ≤ 10 μm TTV
- Compatibility: Designed for 200mm/300mm wafer process chambers
Functional Features:
- Exceptional resistance to plasma sputtering and chemical attack
- Low particle generation to maintain wafer cleanliness
- Precision-machined for optimal gas flow and plasma confinement
- Easy to install and replace as a consumable part
Application: Used in Etch, PVD, and CVD chambers (Centura, Endura platforms) to extend chamber life and ensure process consistency.
