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AMAT 0200-09761

Product Name: Precision Quartz Gas Distribution Nozzle

Product Description: A machined quartz component designed to uniformly inject process gases into semiconductor deposition chambers.

Technical Specifications:

  • Material: High-purity fused quartz

Detailed content

  • Design: Multi-orifice precision nozzle with internal flow channels
  • Tolerances: Orifice diameters held to ±0.01mm
  • Surface Finish: Electropolished internal bore
  • Mounting: Flanged for vacuum-tight installation

    Functional Features:

  • Uniform Gas Flow: Ensures laminar flow and consistent gas distribution
  • Non-Wetting Surface: Prevents process precursor condensation
  • High Purity: Zero metallic contamination critical for advanced processes
  • Corrosion Resistance: Immune to corrosive halogenated process gases

    Application: Used in ultra-high purity CVD and ALD processes for materials like HfO₂, ZrO₂, and Al₂O₃.

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