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AMAT 0200-09707
Product Name: Quartz Gas Distribution Ring / Showerhead Component
Product Description: A high-purity fused quartz component engineered for uniform distribution of process gases across the wafer surface. Designed for high-purity applications where contamination from metallic materials is unacceptable.
Technical Specifications:
- Material: High-purity, synthetic fused silica (quartz)
Detailed content
- Purity: >99.998% SiO₂
- Porosity: Non-porous, gas-tight
- Temperature Resistance: Up to 1100°C continuous
- Dimensional Tolerance: ±0.1 mm
Functional Features:
- Ultra-low metallic impurity content prevents wafer contamination
- Excellent thermal stability and low thermal expansion
- Precision-drilled orifices ensure laminar gas flow and uniform distribution
- Resistant to etching by fluorine and chlorine-based plasmas
- Smooth surface minimizes particle nucleation and adhesion
Application Scenarios: Used in thermal CVD, LPCVD, and Oxidation processes on Applied Materials’ Centura and P5000 platforms, specifically for processes like TEOS oxide deposition where high-purity, non-metallic gas delivery is critical.
