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AMAT 0200-09693
Product Name: Ceramic Process Chamber Component
Product Introduction: A high-purity ceramic component designed for use in semiconductor process chambers, providing electrical isolation and chemical resistance.
Technical Specifications:
- Material: High-purity alumina ceramic (99.9% Al₂O₃)
Detailed content
- Surface Finish: Ultra-smooth polished surface to minimize particle adhesion
- Thermal Stability: Withstands rapid thermal cycling up to 1200°C
- Dielectric Strength: High electrical insulation properties
- Dimensional Tolerance: Precision machining for exact chamber fit
Functional Features:
- Excellent chemical resistance to semiconductor process gases and plasmas
- Low outgassing properties for UHV (Ultra-High Vacuum) compatibility
- High thermal shock resistance for reliable operation in process environments
- Electrical isolation between chamber components and ground
- Long service life in aggressive semiconductor manufacturing conditions
Application Scenarios:
- Electrical isolation in PVD and CVD process chambers
- Component shielding in plasma-enhanced deposition processes
- Insulator for high-voltage RF components in semiconductor tools
- Replacement ceramic part for AMAT Endura and Centura systems
