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AMAT 0200-09557
Product Name: Quartz Focus Ring Assembly
Product Description: A high-purity quartz ring designed to focus and shape plasma in semiconductor etching chambers. It improves process uniformity and protects chamber components from plasma exposure.
Technical Specifications:
- Material: High-purity synthetic fused silica
Detailed content
- Temperature Resistance: Up to 1200°C
- Dimensional Tolerance: ±0.02 mm
- Surface Quality: Polished, free of inclusions and bubbles
- Hydroxyl Content: Ultra-low for contamination control
- Compatibility: Designed for 200mm etch chambers
Functional Features:
- Excellent plasma focusing capability
- High optical transparency for process monitoring
- Resistance to fluorine and chlorine plasma etching
- Low outgassing for vacuum integrity
- Non-contaminating material composition
- Easy cleaning and regeneration
Application Scenarios:
- Plasma etching systems
- Dielectric and poly-silicon etching processes
- Semiconductor wafer fabrication cleanrooms
- AMAT Centura etch platforms
- Advanced node semiconductor manufacturing
