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AMAT 0200-05337
Product Name: Gas Distribution Manifold Assembly
Product Description: A precision-engineered gas distribution manifold for semiconductor process chambers, designed for safe and controlled delivery of process gases into vacuum environments.
Technical Specifications:
- Material: 316L stainless steel
Detailed content
- Number of Gas Ports: 8
- Port Size: 1/4″ VCR connections
- Maximum Operating Pressure: 200 PSIG
- Leak Rate: <1×10⁻⁹ atm-cc/sec He
- Temperature Range: -40°C to +90°C
- Compatibility: All standard semiconductor process gases
Functional Features:
- Multi-port design for simultaneous gas delivery
- High-integrity sealing for zero gas leakage
- Compact, space-efficient design
- Easy installation and maintenance
- Chemical compatibility with aggressive process gases
- Precision machining for reliable performance
Application Scenarios:
- Semiconductor process gas delivery systems
- CVD and ALD chamber gas injection
- Etching process gas distribution
- Vacuum chamber purging systems
- Gas mixing and distribution manifolds
