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AMAT 0200-03313
Product Name: 300mm Fixed-Floating Lift Ring
Product Description: A precision-engineered annular component designed for wafer lifting and positioning within 300mm semiconductor process chambers. It integrates fixed and floating mechanisms to ensure stable, non-contact wafer support during transfer and processing.
Detailed content
Technical Specifications:
- Material: High-purity alumina ceramic (Al₂O₃, 99.6%)
- Outer Diameter: 270mm
- Inner Diameter: 210mm
- Thickness: 12mm
- Surface Finish: Ra ≤ 0.8μm
- Temperature Rating: -20°C to +1200°C
- Flatness: ≤ 0.05mm across the sealing surface
- Vacuum Compatibility: 10⁻⁹ Torr UHV rated
Functional Features:
- Hybrid fixed-floating design compensates for thermal expansion and mechanical misalignment
- Low particle generation to maintain wafer cleanliness
- High chemical resistance to plasma etchants and process gases
- Precision-machined locating slots for accurate assembly
- Non-contaminating, low-outgassing material for cleanroom compliance
Application Scenarios: Wafer lifting and support in Producer SE 300mm PVD/CVD chambers, ensuring stable wafer positioning during deposition and etching processes.
