Detailed content
- High dielectric strength and electrical insulation
- Precision formed to exact chamber dimensions
- Resistant to high-temperature process environments
Functional Features:
- Protects chamber walls from process gas corrosion and deposition
- Maintains process purity by preventing contamination
- Withstands extreme thermal cycling without failure
- Transparent to infrared heating elements for efficient thermal transfer
Application Scenarios:
- Centura and Producer series CVD chambers
- High-temperature semiconductor deposition processes
- Oxide and nitride thin-film growth applications
- Semiconductor processes requiring high-purity environment containment








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