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AMAT 0200-03170
Product Name: Quartz Focus Ring / Gas Baffle
Product Description: A high-purity quartz ring engineered to optimize gas flow dynamics and focus plasma distribution uniformly over the wafer surface during semiconductor processing.
Technical Specifications:
- Material: High-purity synthetic fused silica (quartz)
Detailed content
- Purity: Ultra-low metallic impurities (<1ppb)
- Profile: Precision-machined contoured profile for flow optimization
- Flatness: < 5 microns total thickness variation
Functional Features:
- Promotes laminar gas flow for uniform layer deposition and etching.
- Contains plasma within the process zone, improving process efficiency.
- Chemically inert, preventing contamination and ensuring wafer purity.
- High thermal shock resistance for rapid temperature cycling.
Application Scenarios: Centura and Producer series PECVD, ICP Etch, and ALD chambers.
