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AMAT 0200-00374
Product Name: Quartz Chamber Liner
Product Description: A high-purity fused quartz liner that protects semiconductor chamber walls from plasma erosion and minimizes particle contamination during wafer processing.
Technical Specifications:
- Material: Ultra-low metal synthetic fused silica
Detailed content
- Purity: >99.998% SiO₂, metallic impurities <1ppb
- Wall Thickness: 6mm
- Max Operating Temp: 1100°C
- Surface Finish: Internal & external polished to Ra <0.5μm
Functional Features:
- Excellent resistance to halogen plasma and reactive gas etching.
- Non-porous structure prevents gas absorption and outgassing.
- High thermal shock resistance withstands rapid process cycling.
- Smooth surfaces reduce particle adhesion and facilitate cleaning.
Application Scenarios: Lining for dielectric etch, PECVD, and RTP chambers in 200mm and 300mm wafer production systems.
