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AMAT 0200-00262
Product Name: High-Purity Quartz Chamber Insert Liner
Product Description: A precision-formed fused silica (quartz) liner that lines the interior of semiconductor process chambers. It provides a chemically inert, non-contaminating barrier between process plasmas/gases and the chamber body.
Technical Specifications:
- Material: High-purity synthetic amorphous quartz (SiO₂)
Detailed content
- Purity: ≥ 99.99% for ultra-low contamination
- Form: Cylindrical sleeve with precision-machined flanges
- Temperature Resistance: Continuous operation up to 1100°C
- Surface Finish: Fire-polished internal surface (Ra ≤ 0.2μm)
Functional Features:
- Chemical Inertness: Resists attack by fluorine, oxygen, and hydrogen plasmas
- Low Outgassing: Vacuum-compatible for UHV environments
- Thermal Shock Resistance: Withstands rapid heating/cooling cycles
- Easy Cleaning: Smooth surface resists particle adhesion
Application: Installed in PECVD, Etch, and ALD chambers (Centura, Endura) to protect chamber walls and maintain process purity.
