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AMAT 0190-53515
Product Name: PVD Focusing Ring Assembly
Product Introduction: The 0190-53515 is a consumable hardware component used in Applied Materials PVD chambers (such as the Endura series). It is a ring-shaped structure, typically made of aluminum or a dielectric material, placed around the edge of the wafer or inside the chamber near the target. Its primary function is to shape the plasma density profile and control the electric field lines at the wafer edge, preventing the “edge effect” where deposition rates and film properties differ at the wafer periphery.
Technical Specifications:
- System Compatibility: Various Applied Materials PVD Systems (Endura, SIP)
Detailed content
- Material: Anodized Aluminum, Quartz, or Silicon
- Location: Wafer edge / Chamber sidewall
- Design: Segmented or continuous ring with specific geometry
Functional Features: - Plasma Confinement: Acts as a physical boundary to confine the dense plasma region over the wafer surface.
- Edge Exclusion Control: Shields the wafer edge from excessive deposition or ion bombardment, which can cause flaking or poor adhesion.
- Process Tuning: By changing the material or geometry of the ring, engineers can tune the plasma density profile (e.g., making it more uniform or intentionally higher at the edge).
- Gettering: Traps impurities and sputtered material that would otherwise redeposit on the wafer edge.
Application Scenarios: - Improving within-wafer uniformity for critical layers.
- Reducing “edge roll-off” in film thickness.
- Processes involving high-power sputtering where edge plasma can be unstable.
- Deposition of copper, aluminum, and barrier metals where edge quality affects yield.
