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AMAT 0190-23441

Product Name: Flow Control Valve Assembly

Product Description: A high-purity flow control valve used to precisely regulate the flow rate of process gases in semiconductor vacuum and gas delivery systems.

Technical Specifications:

  • Operating Pressure: Vacuum to 150 PSI

Detailed content

  • Flow Range: Custom calibrated for specific gas types
  • Seal Material: Perfluoroelastomer for chemical resistance
  • Leak Rate: <1×10⁻⁹ atm-cc/sec He
  • Actuation Type: Pneumatic or motor-driven
  • Body Material: 316L stainless steel with electropolish

    Functional Features:

  • Precise and repeatable flow regulation
  • Low dead volume to minimize gas retention
  • Excellent chemical resistance to aggressive gases
  • Fast response for dynamic process adjustment
  • Long service life with low maintenance requirements
  • Compatible with high-purity gas delivery standards

    Application Scenarios:

  • Semiconductor process gas delivery
  • CVD and ALD precursor control
  • Etching gas mixing systems
  • Vacuum purging and venting circuits
  • Cleanroom utility gas distribution

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