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AMAT 0190-17469 Industrial UV Lamp Assembly
Product Description: A high-intensity ultraviolet (UV) lamp assembly designed for plasma generation and photoresist curing in semiconductor manufacturing equipment. It emits high-power UV radiation (200–400 nm) to initiate plasma reactions or cure photoresist films on wafers, ensuring consistent process performance and high throughput. The lamp is engineered for long life, stable output, and compatibility with AMAT process chambers.
Technical Specifications:
– Lamp Type: Mercury-xenon (Hg-Xe) arc lamp
– Power Rating: 1500W
Detailed content
– Voltage: 240V AC
– UV Wavelength Range: 200–400 nm (peak at 365 nm)
– Lifetime: 1500 hours (typical operation)
– Bulb Envelope: Synthetic fused silica (UV-transparent)
– Base Type: Ceramic double-ended
– Dimensions: 150mm (length) × 15mm (diameter)
– Operating Temperature: 0°C to 60°C (ambient)
– Cooling: Forced air cooling
Functional Features:
– High UV intensity for fast plasma generation and photoresist curing
– Stable output throughout lifespan with minimal intensity depreciation
– Synthetic fused silica envelope for maximum UV transmission
– Ceramic base for high-temperature resistance and electrical insulation
– Instant-on capability with full UV output within 3 seconds
– Compatible with AMAT UV lamp housings and power supplies
– Low maintenance with easy replacement
Application Scenarios:
– UV-initiated plasma generation in etch and CVD chambers
– Photoresist curing in lithography and wafer processing lines
– Plasma cleaning of wafer surfaces prior to deposition
– UV-assisted etching processes
– Wafer surface modification for improved adhesion of thin films
