Digital guide
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AMAT 0190-16892
- Product Introduction:
The metrology and inspection system is a vital tool in semiconductor manufacturing for measuring various physical and electrical parameters of semiconductor wafers and devices, as well as detecting defects. It provides critical data for process control, quality assurance, and yield improvement. - Technical Specifications:
- Measurement Accuracy: It can achieve high measurement accuracy for different parameters. For example, in film thickness measurement
Detailed content
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- the accuracy can be as high as ±0.1nm. In defect detection, it can detect defects with a size as small as 10nm.
- Measurement Speed: The system can perform measurements and inspections at a high speed, with a typical throughput of up to 200 wafers per hour, depending on the complexity of the measurement tasks.
- Resolution: It has high – resolution imaging capabilities, with a resolution that can reach sub – nanometer levels in some advanced models. This allows for detailed visualization of the wafer surface and device structures.
- Functional Features:
- Multi – Parameter Measurement: It can measure multiple parameters simultaneously, such as film thickness, critical dimensions (CD), surface roughness, and electrical properties. This provides a comprehensive view of the wafer and device quality, enabling more efficient process control.
- Automated Defect Classification: The system uses advanced image processing and machine – learning algorithms to automatically classify detected defects into different types, such as particles, scratches, and pattern defects. This helps in quickly identifying the root causes of defects and taking corrective actions.
- Data Management and Analysis: It has a built – in data management system that can store and organize large amounts of measurement and inspection data. The system also provides powerful data analysis tools, such as statistical process control (SPC) charts and trend analysis, to help operators monitor process stability and identify potential problems.
- Application Scenarios:
- In – line Process Control: During semiconductor manufacturing, the metrology and inspection system is used for in – line monitoring of key process parameters. For example, after a lithography process, it can measure the critical dimensions of the patterned features to ensure that they meet the design specifications. If any deviations are detected, the process parameters can be adjusted in real – time.
- Final Product Inspection: Before the semiconductor devices are shipped to customers, the metrology and inspection system is used for final product inspection to ensure that they meet the required quality standards. It can detect any defects or non – conformities that may have occurred during the manufacturing process and reject the defective products.
