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AMAT 0190-01947 Process Gas Distribution Manifold
Product Introduction: This is a centralized high-purity gas distribution manifold for semiconductor process equipment, used for multi-path gas collection, distribution, mixing and switching. It provides a clean, low-particle, ultra-low leakage gas pipeline integration scheme, realizing centralized management and stable supply of process gas, and improving the safety and maintainability of the gas system.
Technical Specifications:
- Interface: 12 VCR ports, including 6 inlets and 6 outlets
- Material: 316L electropolished stainless steel
Detailed content
- Maximum Working Pressure: 200 psig
- Leakage Rate: <10⁻⁹ atm·cc/s He
- Working Temperature: -10°C to 80°C
- Dimensions: 300mm × 150mm × 50mm, rack-mounted compact design
- Surface Roughness: Inner wall Ra <0.5 μm, clean and low pollution
Functional Features:
- Modular integrated design, flexible configuration and expansion
- Built-in pressure relief and over-pressure protection function
- Each channel has independent switch, convenient for single-channel maintenance
- Good compatibility with high-purity inert gas, corrosive gas and reactive gas
- Factory pre-assembled and pressure tested, reducing on-site installation time
- Compact structure, saving space of gas cabinet and equipment
Application Scenarios:
- Gas distribution system of multi-chamber cluster equipment such as Centura®
- Centralized gas supply cabinet and gas mixing system in semiconductor factory
- Multi-path gas supply of ALD, CVD and other coating equipment
- Gas distribution of MEMS, advanced packaging and optoelectronic devices
- High-purity gas pipeline integration of R&D and pilot production equipment
