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AMAT 0150-25963 Digital Mass Flow Controller (MFC)
Product Introduction: This is a high-performance digital mass flow controller for semiconductor process equipment, which can realize high-precision measurement and control of gas flow. It adopts advanced digital signal processing and multi-gas calibration technology, with high accuracy, fast response and good stability, and is widely used in various gas supply links that require precise flow control.
Technical Specifications:
- Flow Range: 1 sccm–1000 sccm, multiple ranges are available
Detailed content
- Control Accuracy: ±0.2% F.S. + ±0.05% of reading value
- Repeatability: ±0.1% F.S., ensuring process consistency
- Response Time: <30 ms, realizing fast flow adjustment
- Maximum Inlet Pressure: 100 psig
- Wetted Part Material: 316L stainless steel, PEEK seal, corrosion resistance
- Communication Mode: DeviceNet™, RS-485, compatible with SECS/GEM
- Power Supply: 24 VDC
Functional Features:
- Digital control, on-board storage of multiple gas calibration parameters
- Support multi-gas switching, no need to replace calibration module
- Self-diagnosis function, real-time monitoring of sensor status and flow drift
- On-site zero point and range calibration, convenient for daily maintenance
- Low power consumption, compact structure, suitable for intensive gas cabinet layout
- High long-term stability, reducing calibration frequency
Application Scenarios:
- Precise gas supply of ALD and CVD ultra-thin film deposition equipment
- Gas mixing and proportioning system of semiconductor process equipment
- Wafer wet cleaning and dry plasma cleaning equipment
- High-purity gas delivery system of photovoltaic and display industry
- Gas flow control of laboratory R&D equipment and small-scale production line
