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AMAT 0150-04722C/A High-Flow Vacuum Valve Assembly
Product Overview: The AMAT 0150-04722C/A is a high-performance, high-flow vacuum valve assembly designed for Applied Materials semiconductor equipment vacuum systems. It provides fast, reliable control of vacuum flow in process chambers, load locks, and vacuum pumping lines, enabling rapid chamber evacuation and pressure control. This valve assembly features a pneumatic actuation, zero-leak sealing, and compatibility with ultra-high-vacuum conditions.
Technical Specifications:
- Valve Type: Pneumatically actuated bellows-sealed gate valve, C/A configuration (closed/active).
Detailed content
- Flow Diameter: 50mm (KF50 flange), with a conductance of 150 L/s for nitrogen.
- Operating Pressure: Ultra-high vacuum (UHV) to 1 atm, with a leak rate ≤ 1×10⁻¹² Pa·m³/s (He).
- Actuation: 24V DC pneumatic solenoid, with a response time ≤ 50ms.
- Temperature Range: -20°C to 150°C, suitable for all semiconductor fab environments.
- Material: 316L stainless steel body, with a Viton O-ring seal.
- Mounting: KF50 flange, with standard NW50 vacuum connections.
- Certification: Complies with SEMI F17 vacuum component standards.
Functional Features:
- Provides fast, reliable vacuum flow control for rapid chamber evacuation.
- Delivers zero-leak sealing, maintaining ultra-high-vacuum conditions.
- Pneumatic actuation ensures fast response times for process automation.
- Resists corrosion from process gases and vacuum pumping fluids.
- Easy to install and maintain, with a modular design.
- Integrates seamlessly with AMAT’s vacuum pumping systems.
Application Scenarios:
- Installed in AMAT process chambers and load locks for vacuum control.
- Used in vacuum pumping lines for turbomolecular and dry pumps.
- Applied in 200mm and 300mm wafer fabs for fast chamber cycling.
- Ideal for high-volume production lines requiring rapid vacuum processing.
- Deployed in R&D facilities for vacuum system development.
