Detailed content
- Power Consumption: <10 W
- Voltage Control Range: 0–5 kV DC
- Control Accuracy: ±0.1% of full scale
- Response Time: <5 ms
- Communication Interface: RS-485, Modbus RTU
- Operating Temperature: 0°C to +55°C
- Dimensions: 200 mm × 140 mm × 40 mm
- Weight: 0.75 kg
Functional Features:
- Precise arc voltage control for stable plasma generation
- Fast response time for immediate process adjustments
- High accuracy for consistent process results
- Multiple communication interfaces for system integration
- Self-diagnostic and fault detection capabilities
- Compact design for rack mounting
- High reliability for continuous operation
Application Scenarios:
- Semiconductor plasma etching equipment
- PVD/CVD plasma power systems
- Plasma-enhanced deposition tools
- Arc voltage control systems
- Semiconductor manufacturing process automation











