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AMAT 0110-00077
Product Name: RF Match Network Module
Product Description: A high-performance RF impedance matching network designed to optimize power transfer between RF generators and plasma loads in semiconductor etching and deposition systems.
Technical Specifications:
- Frequency Range: 13.56 MHz
Detailed content
- Power Handling: 500W continuous
- Impedance Range: 5–500 ohms
- Tuning Speed: <100 ms
- Control Interface: Analog 0–10V or digital RS-485
- Operating Temperature: 0°C to +50°C
- Cooling: Forced air cooling
Functional Features:
- Fast and precise impedance matching
- High power transfer efficiency
- Built-in reflected power protection
- Stable performance in dynamic plasma conditions
- Remote control and monitoring capability
- Compatibility with AMAT RF generator systems
Application Scenarios:
- Plasma etching chambers
- PECVD deposition systems
- RF plasma cleaning processes
- Semiconductor wafer processing equipment
- AMAT Centura and Endura RF systems
