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AMAT 0090-02847 RF Match Network Capacitor Assembly
Product Description: A high-performance variable capacitor assembly designed for automatic tuning of RF match networks in semiconductor plasma processing equipment. It provides precise impedance adjustment to ensure maximum RF power transfer from the generator to the process chamber, optimizing plasma stability and process repeatability. The capacitor is engineered to withstand high RF power, harsh process environments, and continuous tuning cycles.
Technical Specifications:
– Capacitance Range: 10 pF to 100 pF (adjustable)
– RF Frequency Range: 400 kHz to 60 MHz
Detailed content
Power Handling: 10 kW continuous (peak 15 kW)
– Voltage Rating: 5 kV RMS
– Material: Ceramic dielectric (Al₂O₃), 316L stainless steel electrodes
– Tuning Mechanism: Precision stepper motor-driven (compatible with AMAT 0090-77041 motor)
– Operating Temperature: 0°C to 50°C
– Dimensions: 80mm × 60mm × 100mm
– Weight: 1.2 kg
– Compliance: SEMI E10, CE, FCC Part 15
Functional Features:
– High-precision capacitance adjustment with ±0.1 pF resolution for optimal impedance matching
– Low loss tangent (tanδ < 0.001) for efficient RF power transfer
– Robust ceramic dielectric resists plasma erosion and chemical contamination
– Sealed design prevents dust and process vapors from entering the tuning mechanism
– Compatible with AMAT RF match network controllers (e.g., AMAT 0190-00958)
– Long service life with > 1 million tuning cycles
– Easy integration with existing RF match network systems
Application Scenarios:
– RF match networks in PECVD (Plasma-Enhanced CVD) chambers
– Reactive Ion Etching (RIE) and ICP (Inductively Coupled Plasma) etch systems
– PVD (Physical Vapor Deposition) sputtering processes with RF bias
– Plasma stripping and photoresist ashing equipment
– Ion implantation source RF match systems
