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AMAT 0051-29503 Ultra-High-Purity Gas Filter Assembly
Product Description: A high-efficiency gas filtration assembly designed for removing particulates and contaminants from ultra-high-purity (UHP) process gases in semiconductor manufacturing. It ensures gas purity meets strict semiconductor process requirements.
Technical Specifications:
Technical Specifications:
- Filter Type: PTFE membrane with 316L stainless steel housing
- Filtration Rating: 0.003μm absolute
Detailed content
- Flow Rate: 50 slm (standard liters per minute)
- Maximum Pressure: 250 PSIG
- Operating Temperature: -40°C to +120°C
- Connection Type: 1/4″ VCR face-seal fittings
- Leak Rate: < 1×10⁻⁹ atm·cc/s He
- Material Wetted Surfaces: 316L electropolished stainless steel, PTFE
- Compliance: SEMI C12, RoHS
Functional Features:
- High-efficiency filtration for sub-micron particulate removal
- Low pressure drop for minimal flow restriction
- Electropolished surfaces prevent particle adhesion and outgassing
- Chemical compatibility with all UHP semiconductor process gases
- Disposable design for easy replacement without system shutdown
- Pre-baked and vacuum-packaged for immediate UHP service
- Compact design for installation in tight gas panel spaces
Application Scenarios:
- UHP gas filtration for CVD, ALD, and etch processes
- Gas line filtration for specialty precursor gases
- Purge gas systems for load locks and transfer chambers
- Gas mixing manifold filtration
- Sub-fab gas distribution system filtration
