Digital guide
You are here:
AMAT 0051-0235
Product Name: 3-Way Manifold Valve Assembly
Product Description: A precision-engineered 3-way manifold valve assembly for semiconductor process gas delivery systems, providing reliable gas flow control and distribution.
Technical Specifications:
- Material: 316L stainless steel
Detailed content
- Number of Ports: 3
- Port Size: 1/4″ VCR connections
- Maximum Operating Pressure: 300 PSIG
- Operating Temperature: -40°C to +100°C
- Leak Rate: <1×10⁻⁹ atm-cc/sec He
- Surface Finish: Electropolished internally to Ra <0.25 μm
- Compatibility: All standard semiconductor process gases
- Valve Type: Pneumatically actuated
Functional Features:
- 3-way design for versatile gas flow control
- High-integrity sealing for zero gas leakage
- Compact, space-efficient configuration
- Easy installation and maintenance
- Chemical compatibility with aggressive process gases
- Precision machining for reliable performance
- Low particle generation for process purity
Application Scenarios:
- Semiconductor process gas delivery systems
- CVD/ALD chamber gas injection
- Etching process gas distribution
- Vacuum chamber purging systems
- Gas mixing and distribution manifolds
