Digital guide
You are here:
AMAT 0051-01848
Product Name: High-Purity Vacuum Exhaust Manifold & Pipeline Fitting Assembly
Product Description: This is a high-purity vacuum exhaust manifold and pipe fitting assembly for semiconductor process equipment, used for the collection, shunting and discharge of process exhaust gas. It ensures smooth gas flow under ultra-high vacuum and resists corrosion of special process gases.
Technical Specifications:
- Material: 316L stainless steel with electrolytic polishing on inner surface, Ra ≤ 0.4μm
Detailed content
- Welding mode: automatic orbital welding, no virtual welding, no leakage
- Applicable vacuum level: 10⁻⁹ Torr ultra-high vacuum environment
- Resistant to corrosion by HF, O₂, Ar, NH₃ and other semiconductor process gases
- Standard vacuum flange interface, compatible with KF, ISO and other connections
- Operating temperature range: -40°C to 200°C
Functional Characteristics:
- Low fluid resistance, ensures high-efficiency vacuum pumping and exhaust
- Excellent airtightness, no leakage under long-term vacuum and pressure cycling
- Smooth inner wall, not easy to accumulate particles and by-products
- Easy to install and disassemble, convenient for system maintenance and leak detection
- Long service life, stable performance in corrosive exhaust environment
Application Scenarios:
- Vacuum exhaust pipeline system for epitaxial deposition (EPI) equipment
- Process chamber vacuum pumping and tail gas discharge pipeline
- High-purity gas distribution and exhaust system in semiconductor fabs
- Exhaust control of etching, PVD and CVD process chambers
