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AMAT 0050-70558
Product Name: Gas Manifold Assembly
Product Description: A precision-engineered gas manifold assembly for semiconductor process equipment, providing safe, controlled distribution of process gases to multiple chamber locations.
Technical Specifications:
- Material: 316L stainless steel
Detailed content
- Number of Gas Channels: 6
- Port Size: 1/4″ VCR connections
- Maximum Operating Pressure: 250 PSIG
- Operating Temperature: -40°C to +90°C
- Leak Rate: <1×10⁻⁹ atm-cc/sec He
- Surface Finish: Electropolished internally to Ra <0.25μm
- Compatibility: All standard semiconductor process gases
Functional Features:
- Multi-channel design for simultaneous gas distribution
- High-integrity sealing for zero gas leakage
- Compact, space-efficient configuration
- Easy installation and maintenance
- Chemical compatibility with aggressive process gases
- Precision machining for reliable performance
- Low particle generation for process purity
Application Scenarios:
- Semiconductor process gas delivery systems
- CVD/ALD chamber gas injection
- Etching process gas distribution
- Vacuum chamber purging systems
- Gas mixing and distribution manifolds
