Digital guide
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AMAT 0050-49204
- Product Name: Gas Manifold Assembly
- Product Description: Precision-engineered multi-port gas distribution manifold for semiconductor process gas delivery systems. It ensures stable, contamination-free routing of process and purge gases within semiconductor fabrication chambers.
- Technical Specifications:
- Material: 316L Electropolished Stainless Steel
Detailed content
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- Port Configuration: Multi-port design with 1/4″ VCR connections
- Surface Finish: Ra ≤ 0.5 μm (electropolished)
- Pressure Rating: 250 PSI (17.2 Bar)
- Operating Temperature: -40°F to 176°F (-40°C to 80°C)
- Leak Integrity: Helium leak-tight to 1×10⁻⁹ atm-cc/sec
- Functional Features:
- Ultra-high purity (UHP) design for corrosive and specialty gases
- Integral valve mounting interface for direct solenoid valve installation
- Low internal volume to minimize gas residence time
- Fully passivated interior to prevent outgassing and particle generation
- Compact, rigid structure for stable panel mounting
- Applications: Gas distribution in PVD, CVD, and Etch chambers; used in Precision 5000 and Centura platforms for process gas control.
