Digital guide
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AMAT 0050-36604
Product Name: High-Purity Gas Filter Assembly
Product Description: A compact, ultra-high-purity (UHP) gas filtration unit designed to remove particulates and contaminants from specialty process gases in semiconductor gas delivery systems, ensuring wafer process integrity.
Technical Specifications:
- Filter Type: PTFE membrane, 0.003μm absolute rating
Detailed content
- Connection: 1/4″ VCR face-seal fittings
- Material: 316L VIM-VAR stainless steel (wetted parts)
- Maximum Pressure: 150 PSIG
- Temperature Range: -40°C to +120°C
- Flow Rate: 10 SLPM (standard)
- Leak Rate: < 1×10⁻⁹ atm-cc/sec He
- Surface Finish: Electropolished (Ra ≤ 0.2μm)
Functional Features:
- Captures sub-10nm particles to prevent wafer defects
- Full compatibility with corrosive gases (HF, HCl, NH₃, SiH₄)
- Non-outgassing, cleanroom-compliant construction
- Disposable, single-use design for contamination control
- Easy inline installation in gas panels and process lines
Application Scenarios: Filtration of ultra-high-purity carrier and process gases in AMAT gas cabinets, distribution panels, and process chambers.
