AMAT 0050-30838
Product Name: Valve Manifold Assembly
Product Description: A precision-manufactured gas distribution and control manifold designed for semiconductor process equipment. It integrates multiple valves and channels to regulate the flow of process gases with high accuracy.
Technical Specifications:
- Material: High-purity 316L stainless steel
Detailed content
- Configuration: Multi-port, multi-valve integrated design
- Pressure Rating: Suitable for high-vacuum and process gas pressure environments
- Surface Finish: Electropolished internal surfaces for ultra-high purity (UHP)
Functional Features:
- Ensures precise, contamination-free control of specialty and process gases.
- Minimizes dead volume to reduce gas residence time and cross-contamination.
- Designed for seamless integration with AMAT Centura and Endura platforms.
Application Scenarios: Gas delivery systems in semiconductor CVD, PVD, and Etch chambers.





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