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AMAT 0050-30838

Product Name: Valve Manifold Assembly

Product Description: A precision-manufactured gas distribution and control manifold designed for semiconductor process equipment. It integrates multiple valves and channels to regulate the flow of process gases with high accuracy.

Technical Specifications:

  • Material: High-purity 316L stainless steel

Detailed content

  • Configuration: Multi-port, multi-valve integrated design
  • Pressure Rating: Suitable for high-vacuum and process gas pressure environments
  • Surface Finish: Electropolished internal surfaces for ultra-high purity (UHP)

    Functional Features:

  • Ensures precise, contamination-free control of specialty and process gases.
  • Minimizes dead volume to reduce gas residence time and cross-contamination.
  • Designed for seamless integration with AMAT Centura and Endura platforms.

    Application Scenarios: Gas delivery systems in semiconductor CVD, PVD, and Etch chambers.

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