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AMAT 0050-21118 Ultra-High-Purity Gas Line Assembly
Product Name: Ultra-High-Purity Gas Line Assembly
Product Description: This component is a precision-fabricated gas line assembly dedicated to semiconductor process equipment, mainly used for the transmission of ultra-high-purity process gas and special gas in the vacuum reaction chamber. It is manufactured in strict accordance with semiconductor industry standards to ensure no leakage, no pollution, and stable gas supply during the wafer manufacturing process.
Technical Specifications:
- Material: 316L electropolished stainless steel, in line with SEMI standard
- Surface treatment: internal electrolytic polishing, low roughness to reduce particle adhesion
Detailed content
- Leak test: helium leak detection, leak rate ≤ 1×10⁻⁹ atm·cc/s
- Pressure range: suitable for high pressure delivery and high vacuum environment
- Connection mode: matched with VCR or face seal interface, high sealing performance
Functional Features:
- Stable and reliable gas transmission, no turbulence and dead volume
- High corrosion resistance, suitable for corrosive and flammable process gas
- Integrated welding structure reduces interface leakage points
- Long service life, suitable for long-term continuous operation of the equipment
Application Scenarios:
- Gas path system of CVD, PVD, etching and other process chambers
- 200mm / 300mm wafer production line
- Semiconductor equipment such as Centura, Endura and Producer series
- Vacuum system and waste gas treatment system supporting equipment
