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AMAT 0041-35140
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Product Name: 300mm Chamber Shield Assembly
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Product Description: One-piece, high-purity ceramic chamber shield designed to protect 300mm process chamber walls from plasma erosion. It defines the plasma reaction zone and ensures process uniformity across large-diameter wafers.
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Technical Specifications:
- Material: 99.6% High-Purity Alumina (Al₂O₃)
Detailed content
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- Diameter: 370mm ID × 390mm OD
- Height: 320mm
- Wall Thickness: 10mm
- Maximum Operating Temperature: 1650°C
- Dielectric Strength: >18 kV/mm
- Surface Finish: Ra < 0.6 μm
- Weight: 7.2 kg
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Functional Features:
- Uniform plasma confinement for consistent wafer-to-wafer performance
- Excellent resistance to fluorine and chlorine plasma erosion
- Low particle generation and easy to clean
- High electrical isolation to prevent parasitic discharges
- Precision-machined for exact chamber fit
- Thermal shock resistant for repeated thermal cycling
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Applications: Plasma confinement and chamber protection in 300mm dielectric etch and PECVD chambers; primary shield component for Centura and Producer 300mm platforms.
