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AMAT 0041-34893 300mm Dual Delivery Faceplate
Product Description: A precision-engineered faceplate component designed for Applied Materials’ Producer series semiconductor processing systems, specifically engineered for dual gas delivery applications in 300mm wafer processing environments.
Technical Specifications:
- Wafer Compatibility: 300mm (12-inch) semiconductor wafers
- System Compatibility: Applied Materials Producer series CVD/PVD chambers
Detailed content
- Material: High-purity, corrosion-resistant aluminum alloy (6061-T6) with precision machining
- Surface Finish: Electropolished and passivated for ultra-clean vacuum compatibility
- Mounting: Precision-drilled mounting holes for direct chamber integration
Functional Features:
- Enables simultaneous dual-gas delivery for advanced thin-film deposition processes
- Minimizes gas mixing and cross-contamination through isolated flow channels
- Provides a uniform gas distribution profile across the entire 300mm wafer surface
- Designed for high-vacuum compatibility with zero outgassing properties
- Precision alignment features ensure proper gas delivery nozzle positioning
Application Scenarios:
- 300mm wafer chemical vapor deposition (CVD) processes
- Physical vapor deposition (PVD) applications requiring dual precursor delivery
- Advanced semiconductor manufacturing for logic and memory chips
- High-volume production fabs utilizing Producer series processing equipment
- Process development and R&D environments for next-generation semiconductor materials
