Digital guide
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AMAT 0041-10824
- Product Name: 300mm Chamber Shield Liner
- Product Description: A large, cylindrical metallic liner that protects the inner chamber walls from plasma exposure and defines the plasma reaction zone in semiconductor etch processes.
- Technical Specifications:
- Material: High-grade Aluminum Alloy (6061-T6)
- Coating: Hard-anodized, 60μm thickness
Detailed content
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- Diameter: 340mm ID x 360mm OD
- Height: 280mm
- Surface Finish: Ra ≤ 0.5 μm (electropolished)
- Weight: 5.8 kg
- Functional Features:
- Superior resistance to fluorine/chlorine plasma erosion
- Smooth, non-porous surface minimizes particle trapping
- Optimized geometry for uniform plasma distribution
- Precision alignment features for chamber centering
- High structural rigidity under thermal cycling
- Easy installation and removal for maintenance
- Applications: Plasma confinement liner in dielectric etch chambers; primary shield component for 300mm Centura Etch platforms.
