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AMAT 0041-04667
Product Name: Chamber Liner Assembly
Product Description: A high-purity chamber liner assembly designed for semiconductor process chambers, providing a protective interior surface while maintaining process purity and vacuum integrity.
Technical Specifications:
- Material: High-purity quartz (fused silica)
Detailed content
- Length: 480 mm
- Diameter: 300 mm
- Wall Thickness: 9 mm
- Surface Finish: Polished to Ra <0.2 μm
- Temperature Resistance: Up to 1150°C
- Chemical Compatibility: Inert to all semiconductor process gases
- Vacuum Rating: 10⁻¹⁰ Torr ultimate pressure
- Dimensional Tolerance: ±0.05 mm
Functional Features:
- Ultra-high purity to prevent wafer contamination
- Excellent thermal shock resistance
- Transparent for real-time process monitoring
- Low particle generation during operation
- Easy cleaning and maintenance
- High dimensional stability at elevated temperatures
- Chemical inertness to aggressive process chemistries
Application Scenarios:
- Semiconductor process chamber liners
- High-temperature annealing systems
- Thermal processing equipment
- Vacuum chamber protective linings
- Wafer fabrication process chambers
