Digital guide
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AMAT 0040-84051
- Product Name: 300mm Ceramic Heater Assembly
- Product Description: High-performance ceramic heater for semiconductor wafer processing. It provides uniform, precise heating for wafer susceptors in high-vacuum deposition environments.
- Technical Specifications:
- Wafer Size: 300mm (12″) compatible
- Heating Element: Molybdenum embedded in alumina ceramic
Detailed content
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- Power Rating: 3.0 kW
- Temperature Range: 100°C to 550°C
- Temperature Uniformity: ±2°C across wafer surface
- Supply Voltage: 208V AC, 3-phase
- Insulation Resistance: >100 MΩ at 500V DC
- Functional Features:
- Ultra-uniform heat distribution for consistent wafer processing
- Rapid heat-up and cool-down cycles
- High-temperature ceramic construction for vacuum stability
- Low thermal mass for responsive temperature control
- Built-in over-temperature protection sensors
- Direct-mount design for easy susceptor integration
- Applications: Wafer heating in PVD, CVD, and ALD chambers; primary heating source for 300mm Endura and Centura platforms.
