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AMAT 0040-78440

Product Name: CMP Process Component (Titan Head Assembly Part)

Product Description: A precision mechanical component for the Titan Head assembly on Applied Materials’ CMP equipment. It is a critical part of the wafer carrier and polishing interface system.

Technical Specifications:

  • Material: High-purity, machined engineering polymer or metal alloy for CMP compatibility.

Detailed content

  • Tolerances: Ultra-high precision machining for critical alignment and fit.
  • Surface Finish: Fine-polished surfaces to minimize particle generation and friction.

    Functional Features:

  • Ensures precise alignment between the polishing head and wafer.
  • Resists degradation from harsh chemical slurries and mechanical abrasion.
  • Contributes to stable and repeatable CMP process performance.

    Application Scenarios:

  • Integrated into Titan Head assemblies for Mirra CMP systems.
  • Functions within the wafer polishing interface for dielectric and metal layer planarization.

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