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AMAT 0040-76142

Product Description: A high-precision chamber liner component for 200mm semiconductor processing systems, providing a protective interior surface for vacuum chambers while maintaining process purity.

Technical Specifications:

  • Material: High-purity aluminum alloy

Detailed content

  • Surface Finish: Electropolished to Ra <0.3μm
  • Internal Diameter: 300mm
  • Wall Thickness: 8mm
  • Vacuum Compatibility: UHV suitable
  • Operating Temperature: -40°C to +120°C
  • Coating: Anodized (60μm thickness) for corrosion resistance

    Functional Features:

  • Ultra-smooth surface to minimize particle generation
  • High dimensional accuracy for perfect fit
  • Excellent corrosion resistance to process gases
  • Lightweight yet structurally rigid
  • Easy to clean and maintain
  • Compatible with various vacuum sealing methods

    Application Scenarios:

  • 200mm wafer processing systems
  • PVD and CVD chamber liners
  • Etching equipment interior components
  • Vacuum chamber protective linings
  • Process chamber gas distribution components

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