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AMAT 0040-75717
Product Name: CMP Head Membrane / Diaphragm
Product Description: A flexible, elastomeric membrane for the CMP polishing head. It provides uniform pneumatic pressure distribution across the back of the wafer to ensure planar polishing.
Technical Specifications:
- Material: High-grade, chemically resistant elastomer (e.g., EPDM, Neoprene, or FFKM).
Detailed content
- Design: Precision-molded to exact contours for specific Titan Head models.
- Durometer: Medium hardness for optimal flexibility and pressure transmission.
- Thickness: Uniform thin profile for sensitive pressure control.
Functional Features:
- Excellent chemical resistance to CMP slurries and deionized water.
- Delivers uniform pressure distribution for excellent within-wafer uniformity.
- Flexible yet durable to withstand millions of pressure cycles.
- Low permeability to prevent air leaks and maintain pressure stability.
Application Scenarios:
- Integrated into AMAT Mirra and Reflexion CMP Titan Heads.
- Critical for achieving global and local planarity in advanced IC manufacturing.
