Digital guide
You are here:
AMAT 0040-51771
Product Name: Chamber Liner Assembly
Product Description: A protective liner installed inside semiconductor processing chambers to shield the main chamber body from plasma exposure, chemical corrosion, and process byproduct accumulation.
Technical Specifications:
- Material: High-purity quartz or anodized aluminum
Detailed content
- Dimensional Accuracy: ±0.02 mm machining tolerance
- Temperature Resistance: Up to 1200°C for quartz versions
- Coating: Optional plasma-resistant coating
- Weight: 0.8–1.2 kg depending on chamber size
- Compatibility: Designed for standard AMAT chamber profiles
Functional Features:
- Isolates chamber wall from direct plasma contact
- Reduces particle contamination during processing
- Extends overall chamber service life
- Simplifies routine cleaning and replacement
- Maintains consistent plasma environment stability
- Resists etching by fluorine and chlorine chemistries
Application Scenarios:
- Plasma etch chambers
- PVD and CVD processing equipment
- Semiconductor wafer fabrication cleanrooms
- High-density plasma processing systems
- AMAT Centura and Endura platforms
