Digital guide
You are here:
AMAT 0040-48767
- Product Name: Cathode Base, Electrostatic Chuck (ESC), 300mm Ultima X
- Product Description: Precision structural base assembly for mounting and supporting 300mm electrostatic chucks in high-density plasma etch chambers.
- Technical Specifications:
- Material: 6061-T6 aluminum alloy, hard-anodized coating
Detailed content
-
- Compatibility: Designed for 300mm Ultima X E-Chuck systems
- Weight: 8.4 kg
- Flatness Tolerance: ±0.015 mm across mounting surface
- Thermal Conductivity: >180 W/m·K
- Mounting Interface: Precision-machined M8 threaded holes
- Surface Finish: Electropolished, Ra ≤ 0.8 μm
- Functional Features:
- Provides rigid, stable support for electrostatic chuck components
- Ensures precise alignment for uniform wafer clamping and heat transfer
- Excellent thermal conductivity for efficient temperature regulation
- Corrosion-resistant anodized coating withstands process chemistries
- Precision-engineered for minimal particle entrapment
- Optimized for high-vacuum compatibility and low outgassing
- Application Scenarios:
- Installed in AMAT Ultima X HDP (High-Density Plasma) etch chambers
- Used in 300mm dielectric etch and deposition processes
- Deployed in advanced semiconductor fabrication (≤14nm nodes)
- Applied in high-volume manufacturing (HVM) plasma etch systems
- Integrated into Centura platform high-power process chambers
