Detailed content
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- Surface Finish: Hard anodized (25μm thickness)
- Flatness Tolerance: ±0.02mm across entire surface
- Mounting Holes: Precision drilled and tapped (M6)
- Weight: 4.8kg
- Functional Features:
- Provides rigid structural support for source components
- Ensures precise alignment of plasma source elements
- Excellent thermal conductivity for heat dissipation
- Corrosion resistant anodized coating
- Lightweight yet high-strength design
- Application Scenarios:
- Used in AMAT 300mm Endura PVD chambers
- Applied in physical vapor deposition processes
- Deployed in metal sputtering applications
- Utilized in semiconductor wafer metallization
- Suitable for high-vacuum manufacturing environments












